Very clean and in beautiful condition as shown in the photographs. This controller and valve set for NF3 Gas came from a TEL Tokyo Electron T-3044SS Etcher system that we are parting out. The system came out of a class 100 clean room, nanofabrication facility and was crate-stored in working condition before being released as surplus.
The Fujikin FCS line specifically uses a pressure-based sonic/choked flow design (critical expansion condition) combined with a highly precise piezo actuator control valve. It’s highly immune to upstream pressure spikes and crosstalk across gas blocks.
All Fujikin parts have been sealed since removal and will stay sealed during storage and shipment.
Hassle-Free Warranty.
Product Description
The Fujikin FCS-4WS-F100 is an ultra-high purity (UHP) Flow Control System (FCS) meticulously engineered for critical gas delivery and chamber-maintenance loops inside advanced semiconductor tools. Operating on a pressure-based sonic/choked flow design, the FCS series delivers extreme flow rate precision completely independent of downstream pressure variations or plumbing manifold fluctuations. This specific unit is factory-calibrated for Nitrogen Trifluoride (NF3) process chemistry. To handle this critical chamber-cleaning agent safely and reliably, the module features premium electropolished gas contact channels, an integrated high-precision pressure transducer, a rapid-response piezo actuator valve, and high-purity metal seals to ensure leak-free performance.
Surplus Condition Note: This mass flow controller was carefully extracted from an intact Tokyo Electron (TEL) etching system operated exclusively within a high-classification, ultra-clean semiconductor cleanroom. The exterior shell is visually immaculate, and the gas ports are clean and free from typical industrial film or particulate residues.
Technical Specifications
- Model Number: FCS-4WS-F100
- Manufacturer: Fujikin Incorporated (Japan)
- Device Core Architecture: Pressure-Based Sonic/Choked Flow Control System
- Process Gas Calibration: NF3 (Nitrogen Trifluoride Chamber Cleaning Gas)
- Actuator Control Valve: Ultra-fast, solid-state Piezoelectric valve mechanism
- Sealing Assembly: High-performance, low-leak metal seal design
- Mounting Interface: Integrated Gas System (IGS) Surface Mount layout
- Application History: Recovered from a pristine cleanroom Tokyo Electron process tool manifold array
