Fujikin FCS-4WS-F80 Mass Flow Control System | CH2F2 Gas, 250kPaG + Warranty
Fujikin FCS-4WS-F80 Mass Flow Control System | CH2F2 Gas, 250kPaG + WarrantyFujikin FCS-4WS-F80 Mass Flow Control System | CH2F2 Gas, 250kPaG + WarrantyFujikin FCS-4WS-F80 Mass Flow Control System | CH2F2 Gas, 250kPaG + WarrantyFujikin FCS-4WS-F80 Mass Flow Control System | CH2F2 Gas, 250kPaG + Warranty
$80.00

Very clean and in beautiful condition as shown in the photographs. This controller and valve set for CH2F2 Gas came from a TEL Tokyo Electron T-3044SS Etcher system that we are parting out. The system came out of a class 100 clean room, nanofabrication facility and was crate-stored in working condition before being released as surplus.

The Fujikin FCS line specifically uses a pressure-based sonic/choked flow design (critical expansion condition) combined with a highly precise piezo actuator control valve. It’s highly immune to upstream pressure spikes and crosstalk across gas blocks.

All Fujikin parts have been sealed since removal and will stay sealed during storage and shipment.

Hassle-Free Warranty.

Product Description

The Fujikin FCS-4WS-F80 is an ultra-precise, high-reliability Flow Control System (FCS) engineered explicitly for critical gas delivery layers within advanced semiconductor etching systems. Utilizing a pressure-based sonic/choked flow architecture (critical expansion condition), the FCS series controls gas delivery independent of downstream pressure fluctuations or manifold hunting. This specific unit is tuned and configured for precise Difluoromethane (CH2F2) process chemistry, featuring ultra-high purity (UHP) gas contact paths, an integrated high-speed piezo-actuated control valve, and premium metal-seal architecture to eliminate external or cross-port micro-leakage during critical dielectric layer isolation.

Surplus Condition Note: This mass flow controller was carefully extracted from an active Tokyo Electron (TEL) etcher system operated exclusively inside a highly monitored cleanroom environment. The assembly is cosmetically immaculate, free from typical industrial film residues, and stored in a clean, dust-free environment to preserve its purity profile.

Technical Specifications

  • Model Number: FCS-4WS-F80
  • Manufacturer: Fujikin Incorporated (Japan)
  • Device Type: Sonic/Choked Flow Control System (Pressure-Based MFC)
  • Gas Calibration: CH2F2 (Difluoromethane / R-32 Process Gas)
  • Valve Technology: Rapid-response Piezoelectric controller valve
  • Sealing Standard: High-purity gas-tight metal seal architecture
  • Mounting Configuration: Modular Integrated Gas System (IGS) Surface Mount footprint
  • Application History: Reclaimed from a working cleanroom Tokyo Electron semiconductor processing tool