Very clean and in beautiful condition as shown in the photographs. This valve was used with C5F8 Gas in a TEL Tokyo Electron T-3044SS Etcher system that we are parting out. The system came out of a class 100 clean room, nanofabrication facility and was crate-stored in working condition before being released to us.
For high-volume, ultra-pure semiconductor or laboratory gas distribution manifolds, the 316L-P composition is top-tier. The "P" designation means the passivated, electropolished inner surfaces that are designed to minimize particle generation and keep the fluid path completely inert.
All Fujikin parts have been sealed since removal and will stay sealed during storage and shipment.
Hassle-Free Warranty.
Product Description
The Fujikin 053795 (Model: FPR-SDAT-21-6.35UGF-AKH) is an ultra-high purity (UHP) pneumatic diaphragm valve engineered specifically for high-demand semiconductor fabrication tools. Operating on a Normally Closed (N.C.) default architecture, this premium valve features an ultra-clean, micro-polished diaphragm design that fully isolates the actuation mechanics from the process stream, preventing particle shed and micro-contamination. Mounted natively to a 316L-P electropolished and passivated stainless steel manifold base, this surface-mount Integrated Gas System (IGS) valve provides a perfectly inert fluid path ideal for the precise control of hazardous, corrosive, or high-purity process gases.
Surplus Condition Note: This unit was professionally extracted from a working Tokyo Electron (TEL) etching system operated strictly within a pristine, high-classification cleanroom environment. The assembly is cosmetically pristine, structurally unblemished, and free from industrial residues.
Technical Specifications
- Part Number: 053795
- Model Designation: FPR-SDAT-21-6.35UGF-AKH
- Manufacturer: Fujikin Incorporated (Japan)
- Actuation Mechanism: Pneumatic / Air Operated
- Default Operational State: Normally Closed (N.C.)
- Manifold Base Metallurgy: 316L-P Stainless Steel (Ultra-Clean Electropolished Path)
- Mounting Configuration: Modular Surface Mount / Integrated Gas System (IGS) Standard
- Actuation Pressure Range: 0.39 to 0.59 MPa (approx. 56.5 to 85.5 PSI)
- Application Lineage: Sourced directly from an intact Tokyo Electron semiconductor processing layout
