Very clean and in beautiful condition as shown in the photographs. This valve was used with C5F8 Gas in a TEL Tokyo Electron T-3044SS Etcher system that we are parting out. The system came out of a class 100 clean room, nanofabrication facility and was crate-stored in working condition before being released to us.
For high-volume, ultra-pure semiconductor or laboratory gas distribution manifolds, the 316L-P composition is top-tier. The "P" designation means the passivated, electropolished inner surfaces that are designed to minimize particle generation and keep the fluid path completely inert.
All Fujikin parts have been sealed since removal and will stay sealed during storage and shipment.
Hassle-Free Warranty.
Product Description
The Fujikin 059577 is a high-capacity, ultra-high purity (UHP) pneumatic process valve from the premier MEGA Series lineup. Engineered specifically for demanding semiconductor gas delivery loops and chamber delivery systems, this larger-profile valve features a Normally Closed (N.C.) direct-diaphragm configuration. This design delivers superior high-flow scaling while completely isolating the air-actuation components from the internal fluid stream to prevent micro-contamination. Mounted to a precision surface-mount 316L-P electropolished stainless steel manifold base, this Integrated Gas System (IGS) component guarantees completely inert, leak-free isolation of high-volume process gases.
Surplus Condition Note: This unit was professionally reclaimed from a working Tokyo Electron (TEL) etching system operated exclusively within a high-classification, ultra-clean semiconductor cleanroom. The assembly is in pristine cosmetic condition, completely unblemished, with pristine seating grooves.
Technical Specifications
- Part Number: 059577
- Manufacturer: Fujikin Incorporated (Japan)
- Product Family: MEGA Series High-Purity Direct-Diaphragm
- Actuation Framework: Pneumatic / Air Operated
- Default State: Normally Closed (N.C.)
- Actuation Pressure Specification: 0.39 to 0.59 MPa (4 to 6 kgf/cm²G / 56.5 to 85.5 PSI)
- Manifold Chemistry: 316L-P Stainless Steel (Passivated and Electropolished Fluid Path)
- Mounting Interface: Expanded Surface Mount / Modular Integrated Gas System (IGS) Standard
- Application History: Extracted directly from a Tokyo Electron etch tool manifold array
